Semiconductor memory device and manufacturing method thereof

ABSTRACT

A semiconductor device, in which both a reduction in a resistivity of a gate electrode and stabilization of transistor characteristics is achieved, and a manufacturing method thereof are disclosed. According to one aspect of the present invention, it is provided a semiconductor device comprising a semiconductor substrate, a plurality of gate electrodes each including an electric charge storage layer formed on the semiconductor substrate through a first insulator, first and second conductor layers, and a second insulator disposed between the electric charge storage layer and the first conductor layer, a barrier insulator provided between the gate electrodes and being in contact with side surfaces alone of the gate electrodes, and an interlayer insulator provided in contact with an upper surface of the second conductor layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of and claims the benefit of priorityunder 35 U.S.C. §120 from U.S. Ser. No. 11/319,743, filed Dec. 29, 2005,and claims the benefit of priority under 35 U.S.C. §119 from JapanesePatent Application No. 2005-262262, filed Sep. 9, 2005, the entirecontents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device and amanufacturing method thereof, and more particularly to a semiconductordevice comprising a non-volatile storage element and a manufacturingmethod thereof.

2. Description of the Related Art

In a semiconductor device comprising a non-volatile storage element, ifhydrogen or the like penetrates into an insulator of a capacitor aftermemory cells are formed, characteristics of the memory cells can bedeteriorated. For example, hydrogen penetrated into a gate insulator ofa memory cell transistor forms trap sites for electric charges. Ifelectrons are trapped in the trap sites or electrons are released fromthe traps, then characteristics of the memory cell transistor fluctuate.In order to avoid such fluctuation, there is a technology which coversthe memory cell transistor with a hydrogen barrier insulator.

With progress in miniaturization of a semiconductor device, it has beendemanded to reduce resistivity of a silicide layer formed in an upperpart of a gate electrode in order to achieve further miniaturization andhigher speed operation of the semiconductor device. In general, thehydrogen barrier insulator is formed to cover the memory cell transistorafter forming the silicide layer. Jpn. Pat. Appln. KOKAI Publication No.2004-241780 discloses an example of a semiconductor device having such aconfiguration. In the configuration, a memory cell transistor havingtungsten silicide (WSi) layer on the top of the gate electrode iscovered with a stress buffering oxide film, and a space between adjacentmemory cell transistors is filled with a spacer film (e.g., siliconnitride (Si₃N₄) film). After etching-back the spacer film, entire memorycells including an upper surface of the etched back spacer film arecovered with an etching stopper film (e.g., Si₃N₄ film). The etchingstopper film also has a function as a hydrogen barrier insulator. Morespecifically, the hydrogen barrier insulator is formed above the gateelectrode without contacting with the silicide layer formed in the topof the gate electrode.

Silicide having a lower resistivity, e.g., cobalt silicide (CoSi) is aptto be deteriorated during a high-temperature heat treatment as comparedwith a conventional silicide material, e.g., WSi. If the hydrogenbarrier insulator, e.g., Si₃N₄ film, is formed after forming CoSi, thenCoSi tends to aggregate during a high-temperature CVD process forforming the Si₃N₄ film, thereby resulting in a problem such as anincrease in a resistivity or disconnection of the silicide layer in anextreme case.

BRIEF SUMMARY OF THE INVENTION

According to one aspect of the present invention, it is provided asemiconductor device comprising: a semiconductor substrate; a pluralityof gate electrodes each including an electric charge storage layerformed on the semiconductor substrate through a first insulator, firstand second conductor layers, and a second insulator disposed between theelectric charge storage layer and the first conductor layer; a barrierinsulator provided between the gate electrodes and being in contact withside surfaces alone of the gate electrodes; and an interlayer insulatorprovided in contact with an upper surface of the second conductor layer.

According to another aspect of the present invention, it is provided asemiconductor device comprising: a plurality of memory cells formed on asemiconductor substrate, electrically connected in series, and eachcomprising a first gate electrode including first and second conductorlayers, the second conductor layer being provided in an upper part ofthe first gate electrode; first and second selecting transistorsprovided at either end of the plurality of memory cells, electricallyconnected with the memory cells in series, and each comprising a secondgate electrode including first and second conductor layers, the secondconductor layer being provided in an upper part of the second gateelectrode; a first contact region provided in the semiconductorsubstrate on outer side of the second gate electrode of the firstselecting transistor; a second contact region provided in thesemiconductor substrate on outer side of the second gate electrode ofthe second selecting transistor; a first contact electrode connectedwith the first contact region; a second contact electrode connected withthe second contact region; a barrier insulator being in contact withside surfaces alone of the first and second gate electrodes and thefirst and second contact electrodes; an interlayer insulator provided incontact with an upper surface of the second conductor layer; a firstwiring connected with the first contact electrode; and a second wiringconnected with the second contact electrode.

According to still another aspect of the present invention, it isprovided a manufacturing method of a semiconductor device, comprising:forming an electric charge storage layer on a semiconductor substratethrough a first insulator; forming a first conductor layer on theelectric charge storage layer through a second insulator to form aplurality of gate electrodes; forming a barrier insulator between thegate electrodes, the barrier insulator being in contact with sidesurfaces alone of the gate electrodes; forming a second conductor layerin an upper part of the conductor layer; and forming an interlayerinsulator coming into contact with an upper surface of the secondconductor layer.

According to still another aspect of the present invention, it isprovided a manufacturing method of a semiconductor device, comprising:forming a first conductor layer on a semiconductor substrate through agate insulator to form first gate electrodes of first and secondselecting transistors; forming an electric charge storage layer on thesemiconductor substrate through a first insulator; forming a secondconductor layer on the electric charge storage layer through a secondinsulator to form a plurality of second gate electrodes of memory cells,the memory cells being arranged between the first and second selectingtransistors; forming source/drain regions in a plurality of regions ofthe semiconductor substrate between the first and second gate electrodesof the first and second selecting transistors and the memory cells, thesource/drain regions electrically connecting the first and secondselecting transistors and the memory cells in series; forming a first orsecond contact region in the semiconductor substrate in the oppositeside of the source/drain region with respect to first gate electrode ofthe first or second selecting transistor; depositing a third insulatorbetween the first and second gate electrodes; removing a part of thethird insulator to expose at least a part of side surfaces of the firstand second gate electrodes; forming a barrier insulator on the thirdinsulator and the exposed surfaces of the first and second gateelectrodes; removing the barrier insulator on an upper surface of thefirst and second gate electrodes; forming a third conductor layer in anupper part of the first and second conductor layer; forming aninterlayer insulator coming into contact with an upper surface of thethird conductor layer; forming an electrode through the third insulator,the barrier insulator and the interlayer insulator and connected withthe contact region; and forming a wiring connected with the electrode.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

FIG. 1 is a plan view illustrating an example of a semiconductor deviceaccording to a first embodiment of the present invention;

FIG. 2 is a cross-sectional view in a bit line direction illustrating anexample of the semiconductor device according to the first embodiment ofthe present invention taken along a cutting-plane line A-A in FIG. 1;

FIGS. 3A to 3H are cross-sectional views illustrating an example of amanufacturing process of the semiconductor device according to the firstembodiment;

FIG. 4 is a cross-sectional view illustrating an example of asemiconductor device according to a first modification of the presentinvention;

FIG. 5 is a cross-sectional view illustrating an example of asemiconductor device according to a second modification of the presentinvention;

FIG. 6 is a cross-sectional view illustrating an example of asemiconductor device according to a third modification of the presentinvention;

FIG. 7 is a cross-sectional view illustrating an example of asemiconductor device according to a fourth modification of the presentinvention;

FIG. 8 is a cross-sectional view illustrating an example of asemiconductor device according to a fifth modification of the presentinvention;

FIG. 9 is a cross-sectional view illustrating an example of asemiconductor device according to a sixth modification of the presentinvention;

FIG. 10 is a plan view illustrating an example of a semiconductor deviceaccording to a second embodiment of the present invention;

FIG. 11 is a cross-sectional view in a bit line direction illustratingan example of the semiconductor device according to the secondembodiment of the present invention taken along a cutting-plane line B-Bin FIG. 10; and

FIG. 12 is a cross-sectional view in a bit line direction illustratingan example of a semiconductor device according to a third embodiment ofthe present invention.

DETAILED DESCRIPTION OF THE INVENTION

The embodiments of the present invention will be described withreference to the accompanying drawings. Throughout the drawings,corresponding portions are denoted by corresponding reference numerals.Each of the following embodiments is illustrated as one example, andtherefore the present invention can be variously modified andimplemented without departing from the spirits of the present invention.

One embodiment of the present invention provides a semiconductor devicecomprising a hydrogen barrier insulator which is disposed only betweengate electrodes but not above the gate electrode and is provided incontact with side surfaces alone of the gate electrode having a silicidelayer formed therein, and a manufacturing method of the semiconductordevice. In one embodiment of such a semiconductor device, the hydrogenbarrier insulator can be formed before forming the second conductorlayer (the silicide layer), and a high-temperature heat treatment afterthe silicide layer formation can be reduced. As a result, it can beprovided a semiconductor device and a manufacturing method thereof whichcomprises a silicide layer capable of achieving a lower resistivitywithout deteriorating characteristics of a transistor and increasing aresistivity of the gate electrode.

Some embodiments of the present invention will now be described indetail hereinafter taking a non-volatile semiconductor storage device asan example.

First Embodiment

A first embodiment according to the present invention provides asemiconductor storage device and a manufacturing method thereof, inwhich a lower part of a space between gate electrodes is filled with aninter-electrode insulator while leaving an upper part of the gateelectrodes is exposed and a U-like shaped hydrogen barrier insulator isprovided on the inter-electrode insulator. The hydrogen barrierinsulator comes into contact with side surfaces alone of each gateelectrodes.

An NAND type non-volatile semiconductor storage device according to theembodiment will now be described with reference to FIGS. 1 and 2. FIG. 1is a plan view illustrating NAND type memory cells of a semiconductordevice according to the embodiment. FIG. 2 is a cross-sectional view ina bit line direction of a memory cell array according to the embodimenttake along a cutting-plane line A-A in FIG. 1. An NAND type memory cellarray extending in a vertical direction in FIG. 1 comprises: a pluralityof (four in the drawing) memory cells MC connected in series; a drainside selecting transistor STD connected with one end (an upper end inthe drawing) of these memory cells MC; and a source side selectingtransistor STS connected with the other end of the same. Each memorycell array is formed on an active region 16 of a semiconductor substrateseparated by an isolation 14. The memory cells MC of adjacent memorycell arrays arranged in a horizontal direction in the drawing areconnected with each other through a control gate electrode 28 extendingin the horizontal direction. The control gate electrode 28 serves as aword line. Likewise, the drain side selecting transistors STD or sourceside selecting transistors STS arranged in the horizontal direction areconnected with each other through common drain side selective gate line22 d or source side selective gate line 22 s, respectively. The drainside selecting transistor STD is connected with a second wiring (a bitline) 54 through a diffused bits line contact 32 d, a bit line contactelectrode 44 b, a bit line connection pad 46 and an inter-wiring contactelectrode 52. The source side selecting transistor STS is connected witha first wiring (a source line) 48 through a diffused source line contact32 s and a source line contact electrode 44 s.

The each memory cell arrays are connected with each other in a bit linedirection (the vertical direction in FIG. 1) through a bit line 54 andalso connected with each other in a word line direction (the horizontaldirection in FIG. 1) through a source line 48.

Although FIG. 1 shows that each memory cell array includes four memorycells MC, an NAND type memory cell array can include any number ofmemory cells MC.

Referring to FIG. 2, the memory cell array is formed on a well 12provided in a semiconductor substrate 10, e.g., a silicon substrate. Inthe memory cell array, each memory cell MC, the drain side selectingtransistor STD and the source side selecting transistor STS areconnected with each other in the bit line direction through asource/drain region 32 formed in the silicon substrate 10.

The memory cell MC includes a gate insulator 20 formed on the siliconsubstrate 10 and a memory cell gate electrode 22 provided on the gateinsulator 20. The memory cell gate electrode 22 includes an electriccharge storage layer 24 serving as a floating gate electrode, aninter-polycrystal silicon insulator (referred as inter-polysiliconinsulator, hereafter) 26 formed on the electric charge storage layer 24,and a control gate electrode 28 formed on the inter-polysiliconinsulator 26. The control gate electrode 28 can have a laminatedconfiguration of first and second conductor layers 28-1 and 28-2, e.g.,a polysilicon layer 28-1 and a low resistivity silicide layer 28-2, suchas cobalt silicide. The control gate electrode 28 connects with memorycells MC in other memory cell arrays arranged in a word line direction(a direction vertical to a page space of FIG. 2), and thereby serves asa word line.

The gate electrodes 22 d and 22 s of the drain side and source sideselecting transistors STD and STS formed at the respective ends of thememory cell array have a configuration similar to that of the memorycell gate electrode 22, but the floating gate electrode 24 and thecontrol gate electrode 28 are connected with each other through anconnecting portion 27 formed by removing a part of the inter-polysiliconinsulator 26.

Spaces among the gate electrodes 22, 22 d and 22 s of each memory celltransistor MC and the drain side and source side selecting transistorsSTD and STS are filled with a second insulator 36 which is aninter-electrode insulator except an upper part of the control gateelectrode 28. A third insulator 38 having an U-like shape which servesas a hydrogen barrier insulator is formed on the second insulator 36between the gate electrodes 22. Although the third insulator 38 directlycomes into contact with side surfaces alone of the control gateelectrode 28, it is not provided on an upper surface of the control gateelectrode 28, e.g., an upper surface of the second conductor layer 28-2of silicide.

Further, a fourth insulator 40 is formed on the third insulator 38between the gate electrodes 22, 22 d, 22 s, and first and secondinterlayer insulators 42 and 50 are formed to cover an entire structure.

The diffused bit line contact 32 d of the drain side selectingtransistor STD is connected with the second wiring 54 serving as a bitline through the bit line contact electrode 44 b, the bit lineconnection pad 46 and the inter-wiring contact electrode 52 provided inthe fourth insulator 40 and the first and second interlayer insulators42 and 50. The diffused source line contact 32 s of the source sideselecting transistor STS is connected with the first wiring 48 as asource line through the source line contact electrode 44 s provided inthe fourth insulator 40 and the first interlayer insulator 42.

With such a configuration, the third insulator 38 having hydrogenbarrier properties can be formed before forming the second conductorlayer (the silicide layer) 28-2, thereby reducing a high-temperatureheat treatment after forming the silicide layer. Specifically, as asecond conductor layer, it can be used a material, e.g., cobalt silicide(CoSi), which has a low resistivity but is not stable in a hightemperature treatment. As a result, delay in the wiring can besuppressed without increasing the resistivity of the control gateelectrode 28. Furthermore, by forming the third insulator 38 havinghydrogen barrier properties in contact with side surfaces of the gateelectrode 22, it can be prevented hydrogen from diffusing into the gateinsulator 20 through the space between the memory cell gate electrodes22. As a result, characteristics of the memory cell transistor MC can beprevented from deterioration being affected by hydrogen.

Therefore, it can be provided a semiconductor device in which thesilicide layer 28-2 is used in the control gate electrode 28 withoutbeing deteriorated in characteristics of the transistor and increasing aresistivity, and a manufacturing method thereof.

An example of a manufacturing method of the NAND type semiconductorstorage device according to the embodiment will now be described indetail with reference to process cross-sectional views in the bit linedirection depicted in FIGS. 3A to 3H.

(1) First, a material for forming a gate electrode is being deposited ona semiconductor substrate formed wells and isolations therein.

Referring to FIG. 3A, the well 12 and isolation (not shown) are formedin the semiconductor substrate 10, e.g., a silicon substrate. In theembodiment, the well 12 is of a p-type but it can be of an n-type. Forthe isolation, it can be used shallow trench isolation (STI), localoxidation of silicon (LOCOS) or any other isolation technology.

Then, a gate insulator 20 and a first conductor film 24 m are formed onan entire surface of the silicon substrate 10 including an active region16 isolated by the isolation. An inter-polysilicon insulator 26, asecond conductor film 28 m and the first insulator 30 are sequentiallyformed on the first conductor film 24 m. The gate insulator 20 serves asa tunnel oxide of the memory cell transistor, and it can be used, e.g.,a silicon oxide film (an SiO₂ film) having a film thickness ofapproximately 8 nm. The first conductor film 24 m is to be patternedinto a floating gate electrode 24 serving as an electric charge storagelayer, and the second conductor film 28 m is to be patterned into a partof the control gate electrode 28. As the first and second conductorfilms 24 m and 28 m, it can be used, e.g., polysilicon doped with a highconcentration of phosphorous (P) or boron (B). As the inter-polysiliconinsulator 26, it can be used, e.g., a so-called ONO film which has alaminated structure consisting of an SiO₂ film, a silicon nitride film(Si₃N₄ film) and an SiO₂ film, each film thickness falling within arange of 3 nm to 10 nm. The first insulator 30 serves as a mask whenpatterning the memory cell gate electrode 22, and Si₃N₄ film can be usedas the film, for example. Here, before depositing the second conductorfilm 28 m, a part of a region of the inter-polysilicon insulator 26 atwhich the gate electrode of the selecting transistor STD or STS is beingformed is removed to provide the connecting portion 27 so that thefloating gate electrode 24 and the control gate electrode 28 are to beconnected with each other.

(2) Next, the gate electrode is being patterned and then a source/drainregion is being formed between the gate electrodes.

Referring to FIG. 3B, the first insulator 30 is processed into a patternof a gate electrode by lithography and etching. Subsequently, etching isperformed with the first insulator 30 being used as a mask, and thus thesecond conductor film 28 m, the inter-polysilicon insulator 26 and thefirst conductor film 24 m are etched in a self-aligned manner withrespect to the first insulator 30 to form a gate electrode 22 of thememory cell transistor MC, a gate electrode 22 d of the drain sideselecting transistor STD and a gate electrode 22 s of the source sideselecting transistor STS. The gate insulator 20 on the surface of thesilicon substrate 10 between the gate electrodes 22, 22 d and 22 s isexposed by this etching. In this manner, the first conductor film 24 mis patterned into the floating gate electrode 24 serving as the electriccharge storage layer, and the second conductor film 28 m is patternedinto the first conductor layer 28-1 which becomes a part of the controlgate electrode 28.

Moreover, post-oxidation is carried out to recover an etching damagegiven to the surfaces the gate electrodes 22, 22 d and 22 s during gateelectrode patterning, and a post-oxide film 34 is formed on the surfacesof the gate electrodes 22, 22 d and 22 s having the laminated structure.

Then, a dopant is doped into the silicon substrate 10 between the gateelectrodes 22, 22 d and 22 s by, e.g., ion implantation with the gateelectrodes 22, 22 d and 22 s being used as masks, thereby a formingsource/drain region 32, and contact regions 32 d and 32 s. The contactregion 32 d is a diffused bit line contact and the contact region 32 sis a diffused source line contact, respectively. As the dopant to bedoped, it can be used, e.g., arsenic (As) or phosphorous (P) which is ofan n-type in this example. However, in a case where the well 12 is ofthe n-type, it can be used a p-type dopant, e.g., boron (B).

The drain side selecting transistor STD, the memory cell transistor MCand the source side transistor STS in the memory cell array can beelectrically connected with each other through the source/drain regions32.

It is to be noted that the ion implantation for forming the source/drainregion can be performed either after post-oxidation as described aboveor before post-oxidation.

(3) Then, a second insulator is being formed between the memory cellgate electrodes.

Referring to FIG. 3C, a second insulator 36 is deposited on an entiresurface. A thickness of the second insulator 36 is determined so as tocompletely fill a space between the memory cell gate electrodes 22 butnot to completely fill a contact region in which the diffused bit lineand source line contacts 32 d and 32 s are to be formed. Specifically,the second insulator 36 is deposited to a thickness thicker than ½ of adistance between the memory cell gate electrodes 22 but thinner than ½of a width of each of the diffused contact regions 32 d and 32 s. As thesecond insulator 36, it can be used, e.g., a tetraethylorthosilicate(TEOS)-SiO₂ film or a low-dielectric-constant insulator. It is to benoted that the second insulator 36 can be formed by sequentiallydepositing silicon oxide films having different film qualities more thanonce.

(4) Then, the second insulator 36 is being etched back.

Referring to FIG. 3D, the second insulator 36 is etched by anisotropicetching so that it is etched back to a level of side surfaces of thecontrol gate electrode. A surface level of the etched second insulator36 is preferably lower than a boundary between the first conductor layer28-1 and the first insulator 30 but higher than a boundary between thefirst conductor layer 28-1 and the inter-polysilicon insulator 26. Inthe etching process, a sidewall insulator 36 s is formed on one sidesurface of the gate electrodes 22 d and 22 s of the drain side andsource side selecting transistor STD and STS in the contact region.

Additionally, the post-oxide film 34 formed on the side surfaces of thegate electrode 22 above the second insulator 36 is also etched off sothat the side surfaces of the first conductor layer 28-1 are exposed.

(5) Then, a third insulator which is a hydrogen barrier insulator isbeing formed on the second insulator, and an entire surface isplanarized by the fourth insulator.

Referring to FIG. 3E, a third insulator 38 is formed on the secondinsulator 36 and to cover the exposed gate electrodes 22, 22 d and 22 s.The third insulator 38 has an etching rate different from that of thesecond insulator 36 and is an insulator having hydrogen barrierproperties, and, for example, Si₃N₄ film can be used as the film. Thethird insulator 38 directly comes into contact with the side surface ofthe second conductor film 28-1 at the part exposed in the previous step.Therefore, as shown in FIG. 3E, the third insulator 38 is formed into aU-like shape between the memory cell gate electrodes 22. Here, beforeforming the third insulator 38, a very thin native oxide film could beformed on the side surfaces of the second conductor film 28-1, but itcan be ignored in relation to penetration of hydrogen into the memorycell gate electrode 22. Therefore, it can be considered that the thirdinsulator 38 substantially contact directly with the second conductorfilm 28-1 in this case.

Then, a fourth insulator 40 is thickly deposited on an entire surface sothat each space between the gate electrodes 22 is filled with the fourthinsulator 40. For the fourth insulator 40, it is preferable to use aninsulator suitable for planarizing a deep and wide groove, andboro-phospho-silicate glass (BPSG) can be used, for example. The fourthinsulator 40 deposited above the gate electrode 22 is removed andplanarized by, e.g., chemical mechanical polishing (CMP) with the thirdinsulator 38 being used as a stopper. Here, CMP can be also performedwith the first insulator 30 being used as a stopper.

(6) Then, a silicide layer is being formed in an upper part of the gateelectrode 22 as a second conductor layer.

Referring to FIG. 3F, the first and third insulators 30 and 38 on thegate electrodes 22, 22 d and 22 s are removed by etching. If each of thefirst and third insulators 30 and 38 are formed of the same material,e.g., Si₃N₄, these films can be simultaneously removed. During theetching, the fourth insulator 40 between the gate electrodes 22 ispartially left at least. In FIG. 3F, although an entire surfaceincluding a surface of the fourth insulator 40 is depicted in flat,there is no problem even if the fourth insulator 40 is formed not beingentirely flat. By performing etching in this manner, the third insulator38 as the hydrogen barrier insulator is removed from the upper surfaceof the gate electrode 22 and thereby left in the U-like shape betweenthe gate electrodes 22. In this manner, the first conductor layer 28-1,i.e., polysilicon, on the upper surface of each gate electrode 22 can beexposed.

Then, a silicide metal (not shown) is deposited on an entire surface. Asthe silicide metal, it can be used a metal to form a silicide layerhaving a lower resistivity, e.g., cobalt (Co), nickel (Ni), platinum(Pt), titanium (Ti), tantalum (Ta) or others. Moreover, tungsten (W) canbe also utilized. Subsequently, a heat treatment is carried out to reactthe silicide metal with silicon, thereby forming a second conductorlayer 28-2 of a silicide. Thereafter, unreacted silicide metal isremoved. In this manner, it can be formed a control gate electrode 28having a laminated structure of the first conductor layer 28-1 and thesecond conductor layer 28-2, i.e., silicide layer. If the secondconductor layer 28-2 is formed of, e.g., cobalt silicide (CoSi), areduction in a resistivity of the control gate electrode 28 can berealized.

(7) Then, a contact electrode and a first wiring are being formed.

Referring to FIG. 3G, a first interlayer insulator 42 is deposited on anentire surface, and the surface is planarized if necessary. Then, acontact hole 44 h reaching the diffused bit line contact 32 d or thediffused source line contact 32 s is formed in the first interlayerinsulator 42. In regard to etching to form the contact hole 44 h, thefirst interlayer insulator 42 and the fourth insulator 40 aresequentially etched with the third insulator 38 being used as an etchingstopper. In this manner, by using the third insulator 38 as the etchingstopper, the isolation insulator can be prevented from beingunnecessarily etched even if the contact hole 44 h is misaligned. Then,the third insulator 38 and the gate insulator 20 are sequentially etchedto expose the diffused bit line contact 32 d and the diffused sourceline contact 32 s.

Subsequently, each contact hole 44 h is filled with a contact electrodemetal. As the contact electrode metal, it can be used, e.g., a metal,such as aluminum (Al) or tungsten (W), or a semiconductor having a lowresistivity. In this manner, a bit line contact electrode 44 b connectedwith the diffused bit line contact 32 d and a source line contactelectrode 44 s connected with the diffused source line contact 32 s canbe formed. Thereafter, a first wiring metal is deposited on the firstinterlayer insulator 42 and then patterned. As a result, a bit lineconnection pad 46 connected with the bit line contact electrode 44 b anda first wiring (the source line) 48 connected with the source linecontact electrode 44 s can be formed. As the first wiring metal, thematerial used for the contact electrode metal can be used.

(8) Then, a second wiring is being formed.

Referring to FIG. 3H, a second interlayer insulator 50 is deposited onan entire surface of the first interlayer insulator 42, the bit lineconnection pad 46 and the first wiring 48. A second contact hole 52 hreaching the bit line connection pad 46 is formed in the secondinterlayer insulator 50. The second contact hole 52 h is filled with thecontact electrode metal, thereby forming an inter-wiring contactelectrode 52. Furthermore, a second wiring metal is deposited on anentire surface and patterned. As a result, a second wiring (a bit line)54 connected with the inter-wiring contact electrode 52 can be formed.In this manner, the second wiring (the bit line) 54 is connected withthe diffused bit line contact 32 d through the inter-wiring contactelectrode 52, the bit line connection pad 46 and the bit line contactelectrode 44 b.

Then, processes required for the semiconductor device, e.g., multilayerwiring, are carried out, thereby a NAND type semiconductor storagedevice according to the embodiment is completed.

Although the NAND type memory cell array according to the embodiment isshown to have a configuration in which the four memory cell transistorsMC are disposed between the selecting transistors STD and STS, thenumber of the memory cell transistors MC is not limited to four, and thememory cell array can be realized by using any number, e.g., 16 or 32,of the memory cell transistors MC.

In the embodiment, the third insulator 38 serving as the hydrogenbarrier insulator is not left on the upper surface of the gate electrode22 but formed only between the memory cell gate electrodes 22 in theU-like shape, and both side surfaces of the third insulator 38 are incontact with the side surfaces of respective gate electrode 22. As aresult, hydrogen can be prevented from being diffused into the gateinsulator 20 through the silicon oxide films, e.g., the interlayerinsulator 42, 50, formed above the upper surface of the memory cell gateelectrode 22. Therefore, it can be avoided deterioration incharacteristics of the memory cell transistor MC, e.g., a fluctuation ina threshold voltage or a reduction in a breakdown voltage of the gateinsulator due to penetration of hydrogen.

Since the third insulator 38 is not provided on the upper surface of thememory cell gate electrode 22, the third insulator 38 can be formedbefore forming the second conductor layer, i.e., the silicide layer 28-2in an upper part of the gate electrode 22. Thereby, a thermal processafter forming the silicide layer 28-2 can be reduced. Consequently, asthe second conductor layer 28-2, it can be used a silicide, which has alow resistivity but is apt to be affected by a heat treatment at a hightemperature, e.g., cobalt silicide (CoSi). Therefore, a resistivity ofthe control gate electrode 28 serving as the word line can be lowered,and deterioration of the semiconductor device due to a wiring delay ofthe control gate electrode 28 can be reduced.

Furthermore, the third insulator 38 is formed on the second insulator 36between the memory cell gate electrodes 22 and does not contact with theinter-polysilicon insulator 26. As a result, even if electrons aretrapped in the third insulator 38, it can be avoided deterioration incharacteristics such as a fluctuation in a threshold voltage of thememory cell transistor MC caused by, e.g., trapping of electrons in theinter-polysilicon insulator.

Moreover, the third insulator 38 serves as not only the hydrogen barrierinsulator for the memory cell gate electrode 22 but also an etchingstopper when forming the contact hole 44 h by etching. As a result, thecontact hole 44 h can be formed more easily, thereby increasing aprocess margin.

As described above, according to the embodiment, degradation ofelectrical characteristics of the semiconductor device can be avoided,and a process margin can be also improved. Therefore, according to thepresent invention, it can be provided the semiconductor device, whichcan achieve both a reduction in resistivity of the gate electrode andstabilization of characteristics of the transistor thereby achieving ahigher reliability and higher speed operation, and the manufacturingmethod thereof.

The embodiment is not limited to the above-described example, and can bemodified in many ways. Some of modifications of the embodiment will nowbe described with reference to cross-sectional views of a memory cellarray in a bit line direction shown in FIGS. 4 to 9, but the embodimentis not limited to these modifications.

(First Modification)

FIG. 4 shows a cross-sectional view along a bit line direction of asemiconductor device according to a first modification of theembodiment. The first modification is a non-volatile semiconductorstorage device in which a third insulator 38 a as a hydrogen barrierinsulator is formed at a level substantially equal to that of a memorycell gate electrode 22.

In the modification, an etching amount of a second insulator 36 isdecreased, and the third insulator 38 a is formed at a levelsubstantially equal to a level of the memory cell gate electrode 22.That is, the third insulator 38 a is formed between the gate electrodes22 at a level substantially equal to a level of a lower surface of afirst insulator 30, which is used as a mask material for the gateelectrode 22 patterning. In order to prevent the third insulator 38 afrom being removed during etching of the first insulator 30, a fourthinsulator 40 is to be etched not to expose the third insulator 38 a. Inthe modification, the third insulator 38 a comes into contact with thegate electrode 22 only with side surfaces of a second conductor layer (asilicide layer) 28-2 in the gate electrode 22.

According to the modification, since the third insulator 38 a issubstantially formed flat between the gate electrodes 22, an amount ofthe third insulator 38 a between the gate electrodes 28 can be reduced.The third insulator 38 a is formed of, e.g., Si₃N₄ film, and itsrelative dielectric constant is higher than that of SiO₂ film.Therefore, reducing the amount of the third insulator 38 a between thecontrol gate electrodes 28 can decrease a parasitic capacitance betweenthe control gate electrodes 28. As a result, an increase in aninter-wiring capacitance can be suppressed, thereby reducingdeterioration of a wiring delay.

Additionally, since the third insulator 38 a is not provided on an uppersurface of the memory cell gate electrode 22, the third insulator 38 acan be formed before forming the second conductor layer (the silicidelayer) 28-2 in an upper part of the gate electrode 22. As a result, athermal process after forming the silicide layer 28-2 can be reduced.Consequently, as the second conductor layer 28-2, it can be used amaterial having a low resistivity, e.g., CoSi. Therefore, a resistivityof the control gate electrode 28 can be lowered, thereby reducingdeterioration of the semiconductor device due to a wiring delay of thecontrol gate electrode 28.

(Second Modification)

FIG. 5 is a cross-sectional view along a bit line direction of asemiconductor device according to a second modification of theembodiment. The second modification is a non-volatile semiconductorstorage device in which a third insulator 38 b is formed into a deepU-like shape to come into contact with side surfaces of an electriccharge storage layer 24, i.e., a floating gate electrode and a controlgate electrode 28.

In the modification, an etching amount of a second insulator 36 isincreased, and the second insulator 36 is left at a level lower than anupper surface of the electric charge storage layer 24. The thirdinsulator 38 b is formed on the second insulator 36, therebymanufacturing a semiconductor device according to the modification.

The third insulator 38 b according to the modification has a deep U-likeshape, and is in contact with side faces of a memory cell gate electrode22 with a part of the electric charge storage layer (the floating gateelectrode) 24 and an entire control gate electrode 28. Therefore, it canbe effectively prevented hydrogen from penetrating into the gateelectrode 22 from the outside thereof through an interlayer insulatorformed above it.

Further, since the third insulator 38 b is not provided on the uppersurface of the memory cell gate electrode 22, the third insulator 38 bcan be formed before forming a second conductor layer 28-2, i.e., asilicide layer in an upper part of the gate electrode 22. As a result, athermal process after forming the second conductor layer 28-2 can bereduced, and a material having a low resistivity, e.g., CoSi, can beused as the second conductor layer 28-2. Therefore, a resistivity of thecontrol gate electrode 28 can be lowered, thereby reducing deteriorationof the semiconductor device due to a wiring delay of the control gateelectrode 28.

(Third Modification)

FIG. 6 is a cross-sectional view along a bit line direction of asemiconductor device according to a third modification of theembodiment. The third modification is a non-volatile semiconductorstorage device in which a space between memory cell gate electrodes 22is not completely filled with a second insulator 36 and the secondinsulator 36 is formed like a sidewall of the gate electrode 22. Thesecond insulator 36 is formed to expose upper parts of the side surfacesof the gate electrode 22.

In the modification, the second insulator 36 is formed thin. Therefore,the second insulator 36 can be formed under conditions at a higherformation temperature and/or a lower formation speed as compared withthe first embodiment and the first and second modifications in which thespaces between the gate electrodes 22 are filled with the secondinsulator 36. The second insulator 36 formed under such conditions has abetter quality, and an electric charge trap site in the insulator can bereduced, for example. Therefore, it can be suppressed deterioration ofcharacteristics of the memory cell transistor due to electric chargetrapped in the second insulator 36.

Furthermore, a third insulator 38 c is formed from a silicon substrate10 to a top of side surfaces of the gate electrode 22 to cover thesecond insulator 36. The third insulator 38 c comes into contact with anupper part of side surfaces of a control gate electrode 28. Therefore,it can be effectively prevented hydrogen from penetrating into the gateelectrode 22 from the outside thereof through an interlayer insulatorformed above it.

In the modification, since the third insulator 38 c is not formed on theupper surface of the memory cell gate electrode 22, the third insulator38 c can be formed before forming the second conductor layer 28-2, i.e.,the silicide layer in an upper part of the gate electrode 22. As aresult, a thermal process after forming the second conductor layer 28-2can be reduced, and a material having a low resistivity, e.g., CoSi, canbe used as the second conductor layer 28-2. Therefore, a resistivity ofthe control gate electrode 28 can be lowered, thereby reducingdeterioration of the semiconductor device due to a wiring delay of thecontrol gate electrode 28.

In FIG. 6, it is shown that the third insulator 38 c is in contact witha gate insulator 20 at a bottom portion between the gate electrodes 22.However, it can be adopted a configuration in which the second insulator36 is left between the third insulator 38 c and the gate insulator 20 ora configuration in which the gate insulator 20 is removed and the thirdinsulator 38 c is in contact with the silicon substrate 10.

(Fourth Modification)

FIG. 7 is a cross-sectional view along a bit line direction of asemiconductor device according to a fourth modification of theembodiment. The fourth modification is a non-volatile semiconductorstorage device in which a post-oxide film and a second insulator are notprovided between gate electrodes 22 and a third insulator 38 d is incontact with entire side surfaces of the gate electrode 22 of a memorycell transistor.

In the modification, after patterning the gate electrode 22, thepost-oxide film is not formed, or the post-oxide film is formed and thenremoved. Moreover, the third insulator 38 d is formed without formingthe second insulator so that the third insulator 38 d is in contact withentire side surfaces of the gate electrode 22. Therefore, it can beeffectively prevented hydrogen from penetrating into the gate electrode22 from the outside thereof through an interlayer insulator formed aboveit.

Additionally, since the third insulator 38 d is not formed on the uppersurface of the memory cell gate electrode 22, the third insulator 38 dcan be formed before forming a second conductor layer 28-2, i.e., asilicide layer in an upper part of the gate electrode 22. As a result, athermal process after forming the second conductor layer 28-2 can bereduced, and a material having a low resistivity, e.g., CoSi, can beused as the second conductor layer 28-2.

In the modification, since the second insulator 36 can be formed thin,the manufacturing process can be simplified, which contributes to areduction in a manufacturing cost.

In FIG. 7, it is shown that the third insulator 38 d is in contact witha gate insulator 20 at a bottom portion between the memory cell gateelectrodes 22. However, it can be adopted a configuration in which thegate insulator 20 is removed from the bottom portion between the memorycell gate electrodes 22 and the third insulator 38 d is in contact witha silicon substrate 10.

(Fifth Modification)

FIG. 8 is a cross-sectional view along a bit line direction of asemiconductor device according to a fifth modification of theembodiment. The fifth modification is a non-volatile semiconductorstorage device in which a second insulator 36 is removed from diffusedcontact regions 32 d and 32 s of a drain side selecting transistor STDand a source side selecting transistor STS disposed at each end of amemory cell array.

According to the modification, distances between respective gateelectrodes 22 d and 22 s of the drain side and source side selectingtransistors STD and STS and corresponding contact electrodes 44 b and 44s can be reduced, respectively. Therefore, high integration of thesemiconductor device can be realized, which contributes to a reductionin a manufacturing cost.

In the modification, a third insulator 38 is formed into a U-like shapebetween the gate electrodes 22 like the first embodiment and it is incontact with side surfaces of an upper part of the gate electrode 22.Therefore, it can be effectively prevented hydrogen from penetratinginto the gate electrode 22 from the outside thereof through aninterlayer insulator formed above it.

Additionally, since the third insulator 38 is not formed on the uppersurface of the memory cell gate electrode 22, the third insulator 38 canbe formed before forming the second conductor layer 28-2, i.e., thesilicide layer in an upper part of the gate electrode 22. As a result, athermal process after forming the second conductor layer 28-2 can bereduced, and a material having a low resistivity, e.g., CoSi, can beused as the second conductor layer 28-2.

(Sixth Modification)

FIG. 9 is a cross-sectional view along a bit line direction of asemiconductor device according to a sixth modification of theembodiment. The sixth modification is a non-volatile semiconductorstorage device in which a source line 56 is formed in a siliconsubstrate 10 using a diffused layer.

In the modification, when forming isolation, the isolation is formed tobe separated in a region where a source line diffused layer 56 is formedso that a source line is to be formed. In such a structure, afterpatterning a gate electrode 22, a silicon substrate 10 can be exposed ina region where the source line is being formed. Thereafter, like thesource/drain region 32, dopants are doped, thereby forming the sourceline by using the diffused layer 56. It is to be noted that a dopantconcentration in the source line diffused layer 56 can be increased ascompared with that in the source/drain region 32 between the gateelectrodes 22.

In the modification, since a wiring step can be simplified, it cancontribute to a reduction in a manufacturing cost.

In the modification, the third insulator 38 is formed into a U-likeshape between the gate electrodes 22 like the first embodiment, and itis in contact with side surfaces of an upper part of the gate electrode22. Therefore, it can be effectively prevented hydrogen from penetratinginto the gate electrode 22 from the outside thereof through aninterlayer insulator formed above it.

Further, since the third insulator 38 is not formed on the upper surfaceof the memory cell gate electrode 22, the third insulator 38 can beformed before forming the second conductor layer 28-2, i.e., thesilicide layer in an upper part of the gate electrode 22. As a result, athermal process after forming the second conductor layer 28-2 can bereduced, and a material having a low resistivity, e.g., CoSi, can beused as the second conductor layer 28-2.

Second Embodiment

The present invention can be applied to not only the NAND typenon-volatile semiconductor storage device but also any othersemiconductor storage device.

A second embodiment is an NOR type non-volatile semiconductor storagedevice according to the present invention, and will now be describedwith reference to FIGS. 10 and 11. FIG. 10 is a plan view schematicallyshowing a configuration of the NOR type non-volatile semiconductorstorage device according to the embodiment. FIG. 11 is a cross-sectionalview in a bit line direction taken along a cutting-plane line B-B inFIG. 10.

The NOR type non-volatile semiconductor storage device according to theembodiment comprises two memory cell transistors MC between bit linecontact electrodes 44 b, but does not include a selecting transistorsuch as one in the NAND type non-volatile semiconductor storage device.A source line 56 is formed by a diffused layer in a silicon substrate 10between the two memory cell transistors MC.

A configuration of a memory cell gate electrode 22 is the same as thatin the first embodiment, and the electrode 22 includes an electriccharge storage layer 24, i.e., a floating gate electrode, which isformed on a gate insulator 20, an inter-polysilicon insulator 26 formedon the electric charge storage layer 24, and a control gate electrode 28formed on the inter-polysilicon insulator 26. The control gate electrode28 may have a laminated structure of first and second conductor layers28-1 and 28-2, e.g., a polysilicon layer 28-1 and a silicide layer 28-2,such as cobalt silicide. The control gate electrode 28 connects withanother memory cell MC adjacent in a lateral direction in FIG. 10, andthereby serves as a word line.

Further, diffused bit line contacts 32 b are formed at both ends of thetwo memory cells, and a source line diffused layer 56 is formed betweenthe two memory cells.

A part of a side surface of the memory cell gate electrode 22 is coveredwith a post-oxide film 34. A second insulator 36 consisting of, e.g., asilicon oxide is formed over the post-oxide film 34 and a gate insulator20. A third insulator 38 as a hydrogen barrier insulator is formed onthe second insulator 36. The third insulator 38 is formed into a U-likeshape between the memory cell gate electrodes 22, and both side surfacesof the third insulator 38 are in contact with upper side surfaces of thegate electrodes 22. A fourth insulator 40 is formed on the thirdinsulator 38, and then an entire surface is planarized. An upper part ofthe control gate electrode 28 is silicided, thereby forming a secondconductor layer 28-2. As the second conductor layer, it can be used amaterial, e.g., cobalt silicide (CoSi), which has a low resistivity. Afirst interlayer insulator 42 is provided on the fourth insulator 40 andthe control gate electrode 28. A bit line contact electrode 44 bconnected with a diffused bit line contact 32 b is formed in the firstinterlayer insulator 42 and the fourth insulator 40, and a bit line 54connected with the bit line contact electrode 44 b is formed on thefirst interlayer insulator 42.

In the embodiment, the third insulator 38 is also formed into a U-likeshape between the gate electrodes 22 like the first embodiment, and itis in contact with side surfaces of upper parts of the gate electrodes22. Therefore, it can be effectively prevented hydrogen from penetratinginto the gate electrode 22 from the outside thereof through theinterlayer insulator formed above it.

Further, since the third insulator 38 is not formed on the upper surfaceof the memory cell gate electrode 22, the third insulator 38 can beformed before forming the second conductor layer 28-2, i.e., thesilicide layer in an upper part of the gate electrode 22. As a result, athermal process after forming the second conductor layer 28-2 can bereduced. Consequently, as the second conductor layer 28-2, it can beused, e.g., CoSi which has a low resistivity but is not stable in a hightemperature treatment. Therefore, a resistivity of the control gateelectrode 28 serving as a word line can be reduced, thereby alleviatingdeterioration of the semiconductor device due to a wiring delay of thecontrol gate electrode 28.

As described above, the present invention can be also applied to the NORtype non-volatile semiconductor storage device.

In the embodiment, the description has been given as to theconfiguration in which the third insulator 38 is formed into a U-likeshape like the first embodiment, but the configuration can be modifiedand carried out as either one of the first to fifth modifications of thefirst embodiment described above, and the present invention is notlimited thereto.

As described above, the present invention can be applied to not only theNAND type non-volatile semiconductor storage device but also the NORtype non-volatile semiconductor storage device. Furthermore, the presentinvention can be likewise applied to any other non-volatilesemiconductor storage device, such as an AND type and a DiNOR type.

Third Embodiment

The present invention can be applied to not only the floating gateelectrode type non-volatile semiconductor storage device but also anyother semiconductor storage device. In the embodiments described above,the description has been given as to a memory cell which stores electriccharge in the floating gate electrode, the present invention can be alsoapplied to, e.g., an MONOS (metal oxide nitride oxide silicon) typememory cell which stores electric charge in an insulator.

In the third embodiment according to the present invention, the presentinvention is applied to an NAND type non-volatile semiconductor storagedevice in which an MONOS type memory cell is used. FIG. 12 shows anexample of a cross-sectional structure of the semiconductor deviceaccording to the embodiment. According to the embodiment, aconfiguration of the MONOS type non-volatile semiconductor storagedevice is the same as that shown in the plan view of FIG. 1. FIG. 12 isa cross-sectional view of the semiconductor device in a bit linedirection taken along a cutting-plane line A-A in FIG. 1.

The MONOS type memory cell is different from the foregoing embodimentsand uses an insulator as an electric charge storage layer of a memorycell transistor MC in place of a floating gate electrode. Here, theembodiment will be described while mainly focusing on a difference fromthe first embodiment.

A memory cell MC according to the embodiment includes a memory cell gateelectrode 62 provided on a silicon substrate 10. The memory cell gateelectrode 62 includes a fifth insulator 60 formed on the siliconsubstrate 10, a sixth insulator 64 formed on the fifth insulator 60 andserving as an electric charge storage layer, a seventh insulator 66formed on the sixth insulator 64, and a control gate electrode 68 formedon the seventh insulator 66. As the fifth insulator 60, it can be used,e.g., SiO₂ film. As the sixth insulator 64, it can be used, e.g., Si₃N₄film. As the seventh insulator 66, for example, SiO₂ film can be used.The control gate electrode 68 can have a laminated structure of firstand second conductor layers 68-1 and 68-2, e.g., a polysilicon layer68-1 and a silicide layer 68-2 such as cobalt silicide, like the firstembodiment. The control gate electrode 68 connects with memory cells MCof other memory cell arrays adjacent in a direction vertical to a pagespace of FIG. 12, and serves as a word line.

Although gate electrodes 62 d and 62 s of drain side and source sideselecting transistors STD and STS formed at respective ends of thememory cell array have a configuration similar to that of the memorycell gate electrode 62, a gate insulator 20 is formed in place of alaminated film including the fifth insulator 60, the sixth insulator 64and the seventh insulator 66. As the gate insulator 20, it can be used,e.g., SiO₂ film.

Spaces between the gate electrodes 62, 62 d and 62 s of each memory celltransistor MC and the drain side and source side selecting transistorsSTD and STS are filled with a second insulator 36 as an inter-electrodeinsulator. An upper part of the control gate electrode 68 is not buriedin the second insulator 36. A third insulator 38 serving as a hydrogenbarrier insulator is formed into a U-like shape on the second insulator36 between the gate electrodes 62. Although the third insulator 38directly comes into contact with side surfaces of the upper part of thecontrol gate electrode 68, it is not provided on an upper surface of thecontrol gate electrode 68, i.e., on the second conductor layer 68-2.

Any other structure on the gate electrode 62, a wiring configuration andothers are substantially similar to those in the first embodiment,thereby omitting their explanation.

With such a configuration, since the third insulator 38 having hydrogenbarrier properties can be formed before forming a silicide layer as asecond conductor layer 68-2, a high-temperature heat treatment afterforming the second conductor layer can be reduced. Therefore, As thesecond conductor layer 68-2, it can be used a material, for example,CoSi, which has a low resistivity but is not stable in a hightemperature treatment. As a result, a wiring delay can be suppressedwithout increasing a resistivity of the control gate electrode 68.Furthermore, since the third insulator 38 having hydrogen barrierproperties is formed in contact with side surfaces of the gate electrode62, hydrogen can be prevented from being diffused into the fifthinsulator 60 through the inter-electrode insulator between the memorycell gate electrodes 62. Accordingly, it can be avoided deterioration incharacteristics of the memory cell transistor MC due to penetration ofhydrogen.

Therefore, it can be provided the semiconductor device in whichdegradation in characteristics of the transistor can be avoided and thesilicide layer capable of reducing a resistivity is used as the secondconductor layer 68-2 in the control gate electrode 68, and amanufacturing method thereof.

As described above, the present invention is also applied to an MONOStype non-volatile semiconductor storage device.

In the embodiment, although the description has been given as to theconfiguration in which the third insulator 38 is formed into a U-likeshape like that of the first embodiment, the third insulator 38 can beformed in flat as explained in conjunction with the first modificationof the first embodiment. Moreover, as described with reference to thethird modification of the first embodiment, the second insulator 36 canbe formed like sidewalls of each gate electrode 62 by not completelyfilling the space between the memory cell gate electrodes 62 with thesecond insulator 62. Additionally, as described in conjunction with thefourth modification of the first embodiment, the third insulator 38 canbe formed to come into contact with entire side surfaces of each gateelectrode 62 of the memory cell transistor, but the present invention isnot limited to these examples.

Even in a case where the memory cell has the MONOS type configuration,the present invention can be widely applied to any other non-volatilesemiconductor storage devices, e.g., an NOR type, an AND type and aDiNOR type non-volatile semiconductor storage device, as well as theNAND type non-volatile semiconductor storage device, as described in thesecond embodiment. That is, the present invention can be applied to anysemiconductor devices as long as it has a configuration in which aplurality of gate electrodes are connected in series and there is nocontact between the gate electrodes. More specifically, the presentinvention can be advantageously applied to semiconductor devices, suchas a non-volatile semiconductor storage device in which a contactelectrode is disposed with a small margin with respect to an activeregion and a high electrical stress is applied to a gate insulator.

Accordingly, it can be achieved by the present invention to reduce aresistivity of the control gate electrode and to prevent hydrogen fromdiffusing into the gate insulator through the inter-electrode insulatorbetween the memory cell gate electrodes, as well as to improve a processmargin of an etching for forming the contact hole on the contact region.As a result, it can be avoided a deterioration in electricalcharacteristics of the semiconductor device, such as a fluctuation of athreshold voltage of the memory cell transistor, a reduction in abreakdown voltage of the gate insulator, and a wiring delay.

As described above, according to the present invention, electricalcharacteristics of the semiconductor device can be prevented from beingdeteriorated, and a process margin can be also improved. Therefore, itcan be provided the semiconductor device and the manufacturing methodthereof which can achieve both a reduction in a resistivity of the gateelectrode and stabilization of characteristics of the transistor and canallow high-speed operation with high reliability.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the invention in its broader aspects isnot limited to the specific details and representative embodiments shownand described herein. Accordingly, various modifications may be madewithout departing from the spirit or scope of the general inventiveconcept as defined by the appended claims and their equivalents.

1. A semiconductor device comprising: a semiconductor substrate; aplurality of gate electrodes each including an electric charge storagelayer formed on the semiconductor substrate through a first insulator,first and second conductor layers, and a second insulator disposedbetween the electric charge storage layer and the first conductor layer;a barrier insulator provided across a space between the gate electrodesand being in contact with side surfaces alone of the gate electrodes;and an interlayer insulator provided in contact with an upper surface ofthe second conductor layer.
 2. The semiconductor device according toclaim 1, wherein the barrier insulator includes a silicon nitride film.3. The semiconductor device according to claim 1, wherein the barrierinsulator contacts with side surfaces of the second conductor layer. 4.The semiconductor device according to claim 1, wherein the barrierinsulator is formed at a level substantially equal to an upper level ofthe gate electrodes.
 5. The semiconductor device according to claim 1,wherein the barrier insulator contacts with side surfaces of theelectric charge storage layer and the first and second conductor layers.6. The semiconductor device according to claim 1, wherein the barrierinsulator contacts with entire side surfaces of the gate electrodes. 7.The semiconductor device according to claim 1, wherein the secondconductor layer includes one of cobalt silicide, nickel silicide,platinum silicide, titanium silicide and tantalum silicide.
 8. Amanufacturing method of a semiconductor device, comprising: forming anelectric charge storage layer on a semiconductor substrate through afirst insulator; forming a first conductor layer on the electric chargestorage layer through a second insulator to form a plurality of gateelectrodes; forming a barrier insulator across a space between the gateelectrodes, the barrier insulator being in contact with side surfacesalone of the gate electrodes; forming a second conductor layer in anupper part of the first conductor layer; and forming an interlayerinsulator in contact with an upper surface of the second conductorlayer.
 9. The manufacturing method of a semiconductor device accordingto claim 8, wherein the barrier insulator includes a silicon nitridefilm.
 10. The manufacturing method of a semiconductor device accordingto claim 8, wherein the barrier insulator is formed at a level higherthan a level of the second insulator.
 11. The manufacturing method of asemiconductor device according to claim 8, wherein the barrier insulatoris formed at a level lower than a level of the second insulator.
 12. Themanufacturing method of a semiconductor device according to claim 8,wherein the barrier insulator is formed in contact with entire sidesurfaces of the gate electrodes.
 13. The manufacturing method of asemiconductor device according to claim 8, wherein the barrier insulatoris formed at a level substantially equal to an upper level of the gateelectrodes.
 14. The manufacturing method of a semiconductor deviceaccording to claim 8, wherein the second conductor layer includes one ofcobalt silicide, nickel silicide, platinum silicide, titanium silicideand tantalum silicide.
 15. A semiconductor device comprising: asemiconductor substrate; a plurality of gate electrodes each includingan electric charge storage layer formed on the semiconductor substratethrough a first insulator, first and second conductor layers, and asecond insulator disposed between the electric charge storage layer andthe first conductor layer; a third insulator provided across a spacebetween the gate electrodes, a surface level of the third insulatorbeing lower than an upper level of the gate electrodes; a barrierinsulator provided across a space between the gate electrodes and beingin contact with side surfaces alone of the gate electrodes; and aninterlayer insulator provided in contact with an upper surface of thesecond conductor layer.
 16. The semiconductor device according to claim15, wherein the barrier insulator includes a silicon nitride film. 17.The semiconductor device according to claim 15, wherein the barrierinsulator contacts with side surface of the second conductor layer. 18.The semiconductor device according to claim 15, wherein the barrierinsulator is formed at a level substantially equal to an upper level ofthe gate electrodes.
 19. The semiconductor device according to claim 15,wherein the barrier insulator contacts with side surfaces of theelectric charge storage layer and the first and second conductor layers.20. The semiconductor device according to claim 15, wherein the secondconductor layer includes one of cobalt silicide, nickel silicide,platinum silicide, titanium silicide and tatalum silicide.